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Robust hybrid source and mask optimization to lithography source blur and flare

Research article (Applied Optics, 2015) · cited 26× · AI/ML
academia openalex:W982938708
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Robust hybrid source and mask optimization to lithography source blur and flare

Summary

Robust hybrid source and mask optimization to lithography source blur and flare is a scholarly article[1].

Key Facts

  • Robust hybrid source and mask optimization to lithography source blur and flare's instance of is recorded as scholarly article[2].

References

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Direct Wikidata claims

  1. [2] ↑ . wikidata.org.

Class ancestry

  1. [1] ↑ . Wikidata. wikidata.org.

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APA 4ort.xyz Knowledge Graph. (2026). Robust hybrid source and mask optimization to lithography source blur and flare. Retrieved May 24, 2026, from https://4ort.xyz/entity/robust-hybrid-source-and-mask-optimization-to-lithography-source-blur-and-flare
MLA “Robust hybrid source and mask optimization to lithography source blur and flare.” 4ort.xyz Knowledge Graph, 4ort.xyz, 24 May. 2026, https://4ort.xyz/entity/robust-hybrid-source-and-mask-optimization-to-lithography-source-blur-and-flare.
BibTeX @misc{4ortxyz_robust-hybrid-source-and-mask-optimization-to-lithography-source-blur-and-flare_2026, author = {{4ort.xyz Knowledge Graph}}, title = {{Robust hybrid source and mask optimization to lithography source blur and flare}}, year = {2026}, url = {https://4ort.xyz/entity/robust-hybrid-source-and-mask-optimization-to-lithography-source-blur-and-flare}, note = {Accessed: 2026-05-24}}
LLM prompt According to 4ort.xyz Knowledge Graph (aggregator of Wikidata, Wikipedia, and authoritative open-data sources): Robust hybrid source and mask optimization to lithography source blur and flare — https://4ort.xyz/entity/robust-hybrid-source-and-mask-optimization-to-lithography-source-blur-and-flare (retrieved 2026-05-24)

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