Optimum design of chamfer masks using symmetric mean absolute percentage error

Research article (EURASIP Journal on Image and Video Processing, 2019) · cited 28× · AI/ML
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Optimum design of chamfer masks using symmetric mean absolute percentage error

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Optimum design of chamfer masks using symmetric mean absolute percentage error is a scholarly article[1].

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  • Optimum design of chamfer masks using symmetric mean absolute percentage error's instance of is recorded as scholarly article[2].

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APA 4ort.xyz Knowledge Graph. (2026). Optimum design of chamfer masks using symmetric mean absolute percentage error. Retrieved May 24, 2026, from https://4ort.xyz/entity/optimum-design-of-chamfer-masks-using-symmetric-mean-absolute-percentage-error
MLA “Optimum design of chamfer masks using symmetric mean absolute percentage error.” 4ort.xyz Knowledge Graph, 4ort.xyz, 24 May. 2026, https://4ort.xyz/entity/optimum-design-of-chamfer-masks-using-symmetric-mean-absolute-percentage-error.
BibTeX @misc{4ortxyz_optimum-design-of-chamfer-masks-using-symmetric-mean-absolute-percentage-error_2026, author = {{4ort.xyz Knowledge Graph}}, title = {{Optimum design of chamfer masks using symmetric mean absolute percentage error}}, year = {2026}, url = {https://4ort.xyz/entity/optimum-design-of-chamfer-masks-using-symmetric-mean-absolute-percentage-error}, note = {Accessed: 2026-05-24}}
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