In situ capture of spatter signature of SLM process using maximum entropy double threshold image processing method based on genetic algorithm

Research article (Optics & Laser Technology, 2020) · cited 49× · AI/ML
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In situ capture of spatter signature of SLM process using maximum entropy double threshold image processing method based on genetic algorithm

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In situ capture of spatter signature of SLM process using maximum entropy double threshold image processing method based on genetic algorithm is a scholarly article[1].

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  • In situ capture of spatter signature of SLM process using maximum entropy double threshold image processing method based on genetic algorithm's instance of is recorded as scholarly article[2].

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APA 4ort.xyz Knowledge Graph. (2026). In situ capture of spatter signature of SLM process using maximum entropy double threshold image processing method based on genetic algorithm. Retrieved May 24, 2026, from https://4ort.xyz/entity/in-situ-capture-of-spatter-signature-of-slm-process-using-maximum-entropy-double-threshold-image-processing-method-based
MLA “In situ capture of spatter signature of SLM process using maximum entropy double threshold image processing method based on genetic algorithm.” 4ort.xyz Knowledge Graph, 4ort.xyz, 24 May. 2026, https://4ort.xyz/entity/in-situ-capture-of-spatter-signature-of-slm-process-using-maximum-entropy-double-threshold-image-processing-method-based.
BibTeX @misc{4ortxyz_in-situ-capture-of-spatter-signature-of-slm-process-using-maximum-entropy-double-threshold-image-processing-method-based_2026, author = {{4ort.xyz Knowledge Graph}}, title = {{In situ capture of spatter signature of SLM process using maximum entropy double threshold image processing method based on genetic algorithm}}, year = {2026}, url = {https://4ort.xyz/entity/in-situ-capture-of-spatter-signature-of-slm-process-using-maximum-entropy-double-threshold-image-processing-method-based}, note = {Accessed: 2026-05-24}}
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