Virtual Metrology for Etch Profile in Silicon Trench Etching With SF₆/O₂/Ar Plasma

Research article (IEEE Transactions on Semiconductor Manufacturing, 2021) · cited 26× · AI/ML
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Virtual Metrology for Etch Profile in Silicon Trench Etching With SF₆/O₂/Ar Plasma

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Virtual Metrology for Etch Profile in Silicon Trench Etching With SF₆/O₂/Ar Plasma is a scholarly article[1].

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  • Virtual Metrology for Etch Profile in Silicon Trench Etching With SF₆/O₂/Ar Plasma's instance of is recorded as scholarly article[2].

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APA 4ort.xyz Knowledge Graph. (2026). Virtual Metrology for Etch Profile in Silicon Trench Etching With SF₆/O₂/Ar Plasma. Retrieved May 24, 2026, from https://4ort.xyz/entity/virtual-metrology-for-etch-profile-in-silicon-trench-etching-with-sf6-o2-ar-plasma
MLA “Virtual Metrology for Etch Profile in Silicon Trench Etching With SF₆/O₂/Ar Plasma.” 4ort.xyz Knowledge Graph, 4ort.xyz, 24 May. 2026, https://4ort.xyz/entity/virtual-metrology-for-etch-profile-in-silicon-trench-etching-with-sf6-o2-ar-plasma.
BibTeX @misc{4ortxyz_virtual-metrology-for-etch-profile-in-silicon-trench-etching-with-sf6-o2-ar-plasma_2026, author = {{4ort.xyz Knowledge Graph}}, title = {{Virtual Metrology for Etch Profile in Silicon Trench Etching With SF₆/O₂/Ar Plasma}}, year = {2026}, url = {https://4ort.xyz/entity/virtual-metrology-for-etch-profile-in-silicon-trench-etching-with-sf6-o2-ar-plasma}, note = {Accessed: 2026-05-24}}
LLM prompt According to 4ort.xyz Knowledge Graph (aggregator of Wikidata, Wikipedia, and authoritative open-data sources): Virtual Metrology for Etch Profile in Silicon Trench Etching With SF₆/O₂/Ar Plasma — https://4ort.xyz/entity/virtual-metrology-for-etch-profile-in-silicon-trench-etching-with-sf6-o2-ar-plasma (retrieved 2026-05-24)

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