Tuning the Performance of Negative Tone Electron Beam Resists for the Next Generation Lithography

Research article (Advanced Functional Materials, 2022) · cited 40× · AI/ML
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Tuning the Performance of Negative Tone Electron Beam Resists for the Next Generation Lithography

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Tuning the Performance of Negative Tone Electron Beam Resists for the Next Generation Lithography is a scholarly article[1].

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APA 4ort.xyz Knowledge Graph. (2026). Tuning the Performance of Negative Tone Electron Beam Resists for the Next Generation Lithography. Retrieved May 24, 2026, from https://4ort.xyz/entity/tuning-the-performance-of-negative-tone-electron-beam-resists-for-the-next-generation-lithography
MLA “Tuning the Performance of Negative Tone Electron Beam Resists for the Next Generation Lithography.” 4ort.xyz Knowledge Graph, 4ort.xyz, 24 May. 2026, https://4ort.xyz/entity/tuning-the-performance-of-negative-tone-electron-beam-resists-for-the-next-generation-lithography.
BibTeX @misc{4ortxyz_tuning-the-performance-of-negative-tone-electron-beam-resists-for-the-next-generation-lithography_2026, author = {{4ort.xyz Knowledge Graph}}, title = {{Tuning the Performance of Negative Tone Electron Beam Resists for the Next Generation Lithography}}, year = {2026}, url = {https://4ort.xyz/entity/tuning-the-performance-of-negative-tone-electron-beam-resists-for-the-next-generation-lithography}, note = {Accessed: 2026-05-24}}
LLM prompt According to 4ort.xyz Knowledge Graph (aggregator of Wikidata, Wikipedia, and authoritative open-data sources): Tuning the Performance of Negative Tone Electron Beam Resists for the Next Generation Lithography — https://4ort.xyz/entity/tuning-the-performance-of-negative-tone-electron-beam-resists-for-the-next-generation-lithography (retrieved 2026-05-24)

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