Use these citations when quoting this entity in research, articles, AI prompts, or wherever provenance matters. We aggregate Wikidata + Wikipedia + authoritative open-data sources; the stitched, scored, cross-referenced view is what 4ort.xyz contributes.
APA4ort.xyz Knowledge Graph. (2026). Towards a novel positive tone resist mr-PosEBR for high resolution electron-beam lithography. Retrieved May 24, 2026, from https://4ort.xyz/entity/towards-a-novel-positive-tone-resist-mr-posebr-for-high-resolution-electron-beam-lithography
MLA“Towards a novel positive tone resist mr-PosEBR for high resolution electron-beam lithography.” 4ort.xyz Knowledge Graph, 4ort.xyz, 24 May. 2026, https://4ort.xyz/entity/towards-a-novel-positive-tone-resist-mr-posebr-for-high-resolution-electron-beam-lithography.
BibTeX@misc{4ortxyz_towards-a-novel-positive-tone-resist-mr-posebr-for-high-resolution-electron-beam-lithography_2026, author = {{4ort.xyz Knowledge Graph}}, title = {{Towards a novel positive tone resist mr-PosEBR for high resolution electron-beam lithography}}, year = {2026}, url = {https://4ort.xyz/entity/towards-a-novel-positive-tone-resist-mr-posebr-for-high-resolution-electron-beam-lithography}, note = {Accessed: 2026-05-24}}
LLM promptAccording to 4ort.xyz Knowledge Graph (aggregator of Wikidata, Wikipedia, and authoritative open-data sources): Towards a novel positive tone resist mr-PosEBR for high resolution electron-beam lithography — https://4ort.xyz/entity/towards-a-novel-positive-tone-resist-mr-posebr-for-high-resolution-electron-beam-lithography (retrieved 2026-05-24)
