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Theoretical study on trade-off relationships between resolution, line edge roughness, and sensitivity in resist processes for semiconductor manufacturing by extreme ultraviolet lithography
Research article (Japanese Journal of Applied Physics, 2019) · cited 11× · AI/ML
Theoretical study on trade-off relationships between resolution, line edge roughness, and sensitivity in resist processes for semiconductor manufacturing by extreme ultraviolet lithography
Summary
Theoretical study on trade-off relationships between resolution, line edge roughness, and sensitivity in resist processes for semiconductor manufacturing by extreme ultraviolet lithography is a scholarly article[1].
Key Facts
Theoretical study on trade-off relationships between resolution, line edge roughness, and sensitivity in resist processes for semiconductor manufacturing by extreme ultraviolet lithography's instance of is recorded as scholarly article[2].
References
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APA4ort.xyz Knowledge Graph. (2026). Theoretical study on trade-off relationships between resolution, line edge roughness, and sensitivity in resist processes for semiconductor manufacturing by extreme ultraviolet lithography. Retrieved May 24, 2026, from https://4ort.xyz/entity/theoretical-study-on-trade-off-relationships-between-resolution-line-edge-roughness-and-sensitivity-in-resist-processes-
MLA“Theoretical study on trade-off relationships between resolution, line edge roughness, and sensitivity in resist processes for semiconductor manufacturing by extreme ultraviolet lithography.” 4ort.xyz Knowledge Graph, 4ort.xyz, 24 May. 2026, https://4ort.xyz/entity/theoretical-study-on-trade-off-relationships-between-resolution-line-edge-roughness-and-sensitivity-in-resist-processes-.
BibTeX@misc{4ortxyz_theoretical-study-on-trade-off-relationships-between-resolution-line-edge-roughness-and-sensitivity-in-resist-processes-_2026, author = {{4ort.xyz Knowledge Graph}}, title = {{Theoretical study on trade-off relationships between resolution, line edge roughness, and sensitivity in resist processes for semiconductor manufacturing by extreme ultraviolet lithography}}, year = {2026}, url = {https://4ort.xyz/entity/theoretical-study-on-trade-off-relationships-between-resolution-line-edge-roughness-and-sensitivity-in-resist-processes-}, note = {Accessed: 2026-05-24}}
LLM promptAccording to 4ort.xyz Knowledge Graph (aggregator of Wikidata, Wikipedia, and authoritative open-data sources): Theoretical study on trade-off relationships between resolution, line edge roughness, and sensitivity in resist processes for semiconductor manufacturing by extreme ultraviolet lithography — https://4ort.xyz/entity/theoretical-study-on-trade-off-relationships-between-resolution-line-edge-roughness-and-sensitivity-in-resist-processes- (retrieved 2026-05-24)
