Robust 2D patterns process variability assessment using CD-SEM contour extraction offline metrology

Research article (Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE, 2017) · cited 11× · AI/ML

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Robust 2D patterns process variability assessment using CD-SEM contour extraction offline metrology

Summary

Robust 2D patterns process variability assessment using CD-SEM contour extraction offline metrology is a scholarly article^[1].

Key Facts

Robust 2D patterns process variability assessment using CD-SEM contour extraction offline metrology's instance of is recorded as scholarly article^[2].

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Direct Wikidata claims

[2] ↑ Robust 2D patterns process variability assessment using CD-SEM contour extraction offline metrology — instance of (P31): scholarly article. wikidata.org.

Class ancestry

[1] ↑ Robust 2D patterns process variability assessment using CD-SEM contour extraction offline metrology is an instance of scholarly article (scholarly article) [P31, primary]. Wikidata. wikidata.org.

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4ort.xyz Knowledge Graph. (2026). Robust 2D patterns process variability assessment using CD-SEM contour extraction offline metrology. Retrieved May 24, 2026, from https://4ort.xyz/entity/robust-2d-patterns-process-variability-assessment-using-cd-sem-contour-extraction-offline-metrology

MLA

“Robust 2D patterns process variability assessment using CD-SEM contour extraction offline metrology.” 4ort.xyz Knowledge Graph, 4ort.xyz, 24 May. 2026, https://4ort.xyz/entity/robust-2d-patterns-process-variability-assessment-using-cd-sem-contour-extraction-offline-metrology.

BibTeX

@misc{4ortxyz_robust-2d-patterns-process-variability-assessment-using-cd-sem-contour-extraction-offline-metrology_2026, author = {{4ort.xyz Knowledge Graph}}, title = {{Robust 2D patterns process variability assessment using CD-SEM contour extraction offline metrology}}, year = {2026}, url = {https://4ort.xyz/entity/robust-2d-patterns-process-variability-assessment-using-cd-sem-contour-extraction-offline-metrology}, note = {Accessed: 2026-05-24}}

LLM prompt

According to 4ort.xyz Knowledge Graph (aggregator of Wikidata, Wikipedia, and authoritative open-data sources): Robust 2D patterns process variability assessment using CD-SEM contour extraction offline metrology — https://4ort.xyz/entity/robust-2d-patterns-process-variability-assessment-using-cd-sem-contour-extraction-offline-metrology (retrieved 2026-05-24)

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