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Optimization of self-aligned double patterning (SADP)-compliant layout designs using pattern matching for 10nm technology nodes and beyond
Research article (Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE, 2016) · cited 10× · AI/ML
Optimization of self-aligned double patterning (SADP)-compliant layout designs using pattern matching for 10nm technology nodes and beyond
Summary
Optimization of self-aligned double patterning (SADP)-compliant layout designs using pattern matching for 10nm technology nodes and beyond is a scholarly article[1].
Key Facts
Optimization of self-aligned double patterning (SADP)-compliant layout designs using pattern matching for 10nm technology nodes and beyond's instance of is recorded as scholarly article[2].
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APA4ort.xyz Knowledge Graph. (2026). Optimization of self-aligned double patterning (SADP)-compliant layout designs using pattern matching for 10nm technology nodes and beyond. Retrieved May 24, 2026, from https://4ort.xyz/entity/optimization-of-self-aligned-double-patterning-sadp-compliant-layout-designs-using-pattern-matching-for-10nm-technology-
MLA“Optimization of self-aligned double patterning (SADP)-compliant layout designs using pattern matching for 10nm technology nodes and beyond.” 4ort.xyz Knowledge Graph, 4ort.xyz, 24 May. 2026, https://4ort.xyz/entity/optimization-of-self-aligned-double-patterning-sadp-compliant-layout-designs-using-pattern-matching-for-10nm-technology-.
BibTeX@misc{4ortxyz_optimization-of-self-aligned-double-patterning-sadp-compliant-layout-designs-using-pattern-matching-for-10nm-technology-_2026, author = {{4ort.xyz Knowledge Graph}}, title = {{Optimization of self-aligned double patterning (SADP)-compliant layout designs using pattern matching for 10nm technology nodes and beyond}}, year = {2026}, url = {https://4ort.xyz/entity/optimization-of-self-aligned-double-patterning-sadp-compliant-layout-designs-using-pattern-matching-for-10nm-technology-}, note = {Accessed: 2026-05-24}}
LLM promptAccording to 4ort.xyz Knowledge Graph (aggregator of Wikidata, Wikipedia, and authoritative open-data sources): Optimization of self-aligned double patterning (SADP)-compliant layout designs using pattern matching for 10nm technology nodes and beyond — https://4ort.xyz/entity/optimization-of-self-aligned-double-patterning-sadp-compliant-layout-designs-using-pattern-matching-for-10nm-technology- (retrieved 2026-05-24)
