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Multi-objective lithographic source mask optimization to reduce the uneven impact of polarization aberration at full exposure field
Research article (Optics Express, 2019) · cited 19× · AI/ML
Multi-objective lithographic source mask optimization to reduce the uneven impact of polarization aberration at full exposure field
Summary
Multi-objective lithographic source mask optimization to reduce the uneven impact of polarization aberration at full exposure field is a scholarly article[1].
Key Facts
Multi-objective lithographic source mask optimization to reduce the uneven impact of polarization aberration at full exposure field's instance of is recorded as scholarly article[2].
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APA4ort.xyz Knowledge Graph. (2026). Multi-objective lithographic source mask optimization to reduce the uneven impact of polarization aberration at full exposure field. Retrieved May 24, 2026, from https://4ort.xyz/entity/multi-objective-lithographic-source-mask-optimization-to-reduce-the-uneven-impact-of-polarization-aberration-at-full-exp
MLA“Multi-objective lithographic source mask optimization to reduce the uneven impact of polarization aberration at full exposure field.” 4ort.xyz Knowledge Graph, 4ort.xyz, 24 May. 2026, https://4ort.xyz/entity/multi-objective-lithographic-source-mask-optimization-to-reduce-the-uneven-impact-of-polarization-aberration-at-full-exp.
BibTeX@misc{4ortxyz_multi-objective-lithographic-source-mask-optimization-to-reduce-the-uneven-impact-of-polarization-aberration-at-full-exp_2026, author = {{4ort.xyz Knowledge Graph}}, title = {{Multi-objective lithographic source mask optimization to reduce the uneven impact of polarization aberration at full exposure field}}, year = {2026}, url = {https://4ort.xyz/entity/multi-objective-lithographic-source-mask-optimization-to-reduce-the-uneven-impact-of-polarization-aberration-at-full-exp}, note = {Accessed: 2026-05-24}}
LLM promptAccording to 4ort.xyz Knowledge Graph (aggregator of Wikidata, Wikipedia, and authoritative open-data sources): Multi-objective lithographic source mask optimization to reduce the uneven impact of polarization aberration at full exposure field — https://4ort.xyz/entity/multi-objective-lithographic-source-mask-optimization-to-reduce-the-uneven-impact-of-polarization-aberration-at-full-exp (retrieved 2026-05-24)
