mr-PosEBR: a novel positive tone resist for high resolution electron beam lithography and 3D surface patterning
Summary
mr-PosEBR: a novel positive tone resist for high resolution electron beam lithography and 3D surface patterning is a scholarly article[1].
Key Facts
mr-PosEBR: a novel positive tone resist for high resolution electron beam lithography and 3D surface patterning's instance of is recorded as scholarly article[2].
References
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APA4ort.xyz Knowledge Graph. (2026). mr-PosEBR: a novel positive tone resist for high resolution electron beam lithography and 3D surface patterning. Retrieved May 24, 2026, from https://4ort.xyz/entity/mr-posebr-a-novel-positive-tone-resist-for-high-resolution-electron-beam-lithography-and-3d-surface-patterning
MLA“mr-PosEBR: a novel positive tone resist for high resolution electron beam lithography and 3D surface patterning.” 4ort.xyz Knowledge Graph, 4ort.xyz, 24 May. 2026, https://4ort.xyz/entity/mr-posebr-a-novel-positive-tone-resist-for-high-resolution-electron-beam-lithography-and-3d-surface-patterning.
BibTeX@misc{4ortxyz_mr-posebr-a-novel-positive-tone-resist-for-high-resolution-electron-beam-lithography-and-3d-surface-patterning_2026, author = {{4ort.xyz Knowledge Graph}}, title = {{mr-PosEBR: a novel positive tone resist for high resolution electron beam lithography and 3D surface patterning}}, year = {2026}, url = {https://4ort.xyz/entity/mr-posebr-a-novel-positive-tone-resist-for-high-resolution-electron-beam-lithography-and-3d-surface-patterning}, note = {Accessed: 2026-05-24}}
LLM promptAccording to 4ort.xyz Knowledge Graph (aggregator of Wikidata, Wikipedia, and authoritative open-data sources): mr-PosEBR: a novel positive tone resist for high resolution electron beam lithography and 3D surface patterning — https://4ort.xyz/entity/mr-posebr-a-novel-positive-tone-resist-for-high-resolution-electron-beam-lithography-and-3d-surface-patterning (retrieved 2026-05-24)
