Home ›
Entities
› academia
› Modeling and Optimizing the Impact of Process and Equipment Parameters in Sputtering Deposition Systems Using a Gaussian Process Machine Learning Framework
Modeling and Optimizing the Impact of Process and Equipment Parameters in Sputtering Deposition Systems Using a Gaussian Process Machine Learning Framework
Research article (IEEE Transactions on Semiconductor Manufacturing, 2021) · cited 15× · AI/ML
Modeling and Optimizing the Impact of Process and Equipment Parameters in Sputtering Deposition Systems Using a Gaussian Process Machine Learning Framework
Summary
Modeling and Optimizing the Impact of Process and Equipment Parameters in Sputtering Deposition Systems Using a Gaussian Process Machine Learning Framework is a scholarly article[1].
Key Facts
Modeling and Optimizing the Impact of Process and Equipment Parameters in Sputtering Deposition Systems Using a Gaussian Process Machine Learning Framework's instance of is recorded as scholarly article[2].
References
Programmatic citations — every numbered marker resolves to a verifiable graph row below.
Use these citations when quoting this entity in research, articles, AI prompts, or wherever provenance matters. We aggregate Wikidata + Wikipedia + authoritative open-data sources; the stitched, scored, cross-referenced view is what 4ort.xyz contributes.
APA4ort.xyz Knowledge Graph. (2026). Modeling and Optimizing the Impact of Process and Equipment Parameters in Sputtering Deposition Systems Using a Gaussian Process Machine Learning Framework. Retrieved May 24, 2026, from https://4ort.xyz/entity/modeling-and-optimizing-the-impact-of-process-and-equipment-parameters-in-sputtering-deposition-systems-using-a-gaussian
MLA“Modeling and Optimizing the Impact of Process and Equipment Parameters in Sputtering Deposition Systems Using a Gaussian Process Machine Learning Framework.” 4ort.xyz Knowledge Graph, 4ort.xyz, 24 May. 2026, https://4ort.xyz/entity/modeling-and-optimizing-the-impact-of-process-and-equipment-parameters-in-sputtering-deposition-systems-using-a-gaussian.
BibTeX@misc{4ortxyz_modeling-and-optimizing-the-impact-of-process-and-equipment-parameters-in-sputtering-deposition-systems-using-a-gaussian_2026, author = {{4ort.xyz Knowledge Graph}}, title = {{Modeling and Optimizing the Impact of Process and Equipment Parameters in Sputtering Deposition Systems Using a Gaussian Process Machine Learning Framework}}, year = {2026}, url = {https://4ort.xyz/entity/modeling-and-optimizing-the-impact-of-process-and-equipment-parameters-in-sputtering-deposition-systems-using-a-gaussian}, note = {Accessed: 2026-05-24}}
LLM promptAccording to 4ort.xyz Knowledge Graph (aggregator of Wikidata, Wikipedia, and authoritative open-data sources): Modeling and Optimizing the Impact of Process and Equipment Parameters in Sputtering Deposition Systems Using a Gaussian Process Machine Learning Framework — https://4ort.xyz/entity/modeling-and-optimizing-the-impact-of-process-and-equipment-parameters-in-sputtering-deposition-systems-using-a-gaussian (retrieved 2026-05-24)
