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Mitigation of mask three-dimensional induced phase effects by absorber optimization in ArF<sub>i</sub>and extreme ultraviolet lithography
Research article (Journal of Micro/Nanolithography MEMS and MOEMS, 2016) · cited 41× · AI/ML
Mitigation of mask three-dimensional induced phase effects by absorber optimization in ArFiand extreme ultraviolet lithography
Summary
Mitigation of mask three-dimensional induced phase effects by absorber optimization in ArFiand extreme ultraviolet lithography is a scholarly article[1].
Key Facts
Mitigation of mask three-dimensional induced phase effects by absorber optimization in ArFiand extreme ultraviolet lithography's instance of is recorded as scholarly article[2].
References
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Use these citations when quoting this entity in research, articles, AI prompts, or wherever provenance matters. We aggregate Wikidata + Wikipedia + authoritative open-data sources; the stitched, scored, cross-referenced view is what 4ort.xyz contributes.
APA4ort.xyz Knowledge Graph. (2026). Mitigation of mask three-dimensional induced phase effects by absorber optimization in ArF<sub>i</sub>and extreme ultraviolet lithography. Retrieved May 24, 2026, from https://4ort.xyz/entity/mitigation-of-mask-three-dimensional-induced-phase-effects-by-absorber-optimization-in-arf-sub-i-sub-and-extreme-ultravi
MLA“Mitigation of mask three-dimensional induced phase effects by absorber optimization in ArF<sub>i</sub>and extreme ultraviolet lithography.” 4ort.xyz Knowledge Graph, 4ort.xyz, 24 May. 2026, https://4ort.xyz/entity/mitigation-of-mask-three-dimensional-induced-phase-effects-by-absorber-optimization-in-arf-sub-i-sub-and-extreme-ultravi.
BibTeX@misc{4ortxyz_mitigation-of-mask-three-dimensional-induced-phase-effects-by-absorber-optimization-in-arf-sub-i-sub-and-extreme-ultravi_2026, author = {{4ort.xyz Knowledge Graph}}, title = {{Mitigation of mask three-dimensional induced phase effects by absorber optimization in ArF<sub>i</sub>and extreme ultraviolet lithography}}, year = {2026}, url = {https://4ort.xyz/entity/mitigation-of-mask-three-dimensional-induced-phase-effects-by-absorber-optimization-in-arf-sub-i-sub-and-extreme-ultravi}, note = {Accessed: 2026-05-24}}
LLM promptAccording to 4ort.xyz Knowledge Graph (aggregator of Wikidata, Wikipedia, and authoritative open-data sources): Mitigation of mask three-dimensional induced phase effects by absorber optimization in ArF<sub>i</sub>and extreme ultraviolet lithography — https://4ort.xyz/entity/mitigation-of-mask-three-dimensional-induced-phase-effects-by-absorber-optimization-in-arf-sub-i-sub-and-extreme-ultravi (retrieved 2026-05-24)
