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Metal layer single EUV expose at pitch 28: how bright field and NTD resist advantages align

Research article (Extreme Ultraviolet (EUV) Lithography XII, 2021) · cited 10× · AI/ML
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Metal layer single EUV expose at pitch 28: how bright field and NTD resist advantages align

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Metal layer single EUV expose at pitch 28: how bright field and NTD resist advantages align is a scholarly article[1].

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  • Metal layer single EUV expose at pitch 28: how bright field and NTD resist advantages align's instance of is recorded as scholarly article[2].

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Direct Wikidata claims

  1. [2] ↑ . wikidata.org.

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  1. [1] ↑ . Wikidata. wikidata.org.

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APA 4ort.xyz Knowledge Graph. (2026). Metal layer single EUV expose at pitch 28: how bright field and NTD resist advantages align. Retrieved May 24, 2026, from https://4ort.xyz/entity/metal-layer-single-euv-expose-at-pitch-28-how-bright-field-and-ntd-resist-advantages-align
MLA “Metal layer single EUV expose at pitch 28: how bright field and NTD resist advantages align.” 4ort.xyz Knowledge Graph, 4ort.xyz, 24 May. 2026, https://4ort.xyz/entity/metal-layer-single-euv-expose-at-pitch-28-how-bright-field-and-ntd-resist-advantages-align.
BibTeX @misc{4ortxyz_metal-layer-single-euv-expose-at-pitch-28-how-bright-field-and-ntd-resist-advantages-align_2026, author = {{4ort.xyz Knowledge Graph}}, title = {{Metal layer single EUV expose at pitch 28: how bright field and NTD resist advantages align}}, year = {2026}, url = {https://4ort.xyz/entity/metal-layer-single-euv-expose-at-pitch-28-how-bright-field-and-ntd-resist-advantages-align}, note = {Accessed: 2026-05-24}}
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