Investigation of mask absorber induced image shift in EUV lithography

Research article (Extreme Ultraviolet (EUV) Lithography X, 2019) · cited 18× · AI/ML
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Investigation of mask absorber induced image shift in EUV lithography

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Investigation of mask absorber induced image shift in EUV lithography is a scholarly article[1].

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  • Investigation of mask absorber induced image shift in EUV lithography's instance of is recorded as scholarly article[2].

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APA 4ort.xyz Knowledge Graph. (2026). Investigation of mask absorber induced image shift in EUV lithography. Retrieved May 24, 2026, from https://4ort.xyz/entity/investigation-of-mask-absorber-induced-image-shift-in-euv-lithography
MLA “Investigation of mask absorber induced image shift in EUV lithography.” 4ort.xyz Knowledge Graph, 4ort.xyz, 24 May. 2026, https://4ort.xyz/entity/investigation-of-mask-absorber-induced-image-shift-in-euv-lithography.
BibTeX @misc{4ortxyz_investigation-of-mask-absorber-induced-image-shift-in-euv-lithography_2026, author = {{4ort.xyz Knowledge Graph}}, title = {{Investigation of mask absorber induced image shift in EUV lithography}}, year = {2026}, url = {https://4ort.xyz/entity/investigation-of-mask-absorber-induced-image-shift-in-euv-lithography}, note = {Accessed: 2026-05-24}}
LLM prompt According to 4ort.xyz Knowledge Graph (aggregator of Wikidata, Wikipedia, and authoritative open-data sources): Investigation of mask absorber induced image shift in EUV lithography — https://4ort.xyz/entity/investigation-of-mask-absorber-induced-image-shift-in-euv-lithography (retrieved 2026-05-24)

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