ILT optimization of EUV masks for sub-7nm lithography

Research article (33rd European Mask and Lithography Conference, 2017) · cited 18× · AI/ML
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ILT optimization of EUV masks for sub-7nm lithography

Summary

ILT optimization of EUV masks for sub-7nm lithography is a scholarly article[1].

Key Facts

  • ILT optimization of EUV masks for sub-7nm lithography's instance of is recorded as scholarly article[2].

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Direct Wikidata claims

  1. [2] . wikidata.org.

Class ancestry

  1. [1] . Wikidata. wikidata.org.

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APA 4ort.xyz Knowledge Graph. (2026). ILT optimization of EUV masks for sub-7nm lithography. Retrieved May 24, 2026, from https://4ort.xyz/entity/ilt-optimization-of-euv-masks-for-sub-7nm-lithography
MLA “ILT optimization of EUV masks for sub-7nm lithography.” 4ort.xyz Knowledge Graph, 4ort.xyz, 24 May. 2026, https://4ort.xyz/entity/ilt-optimization-of-euv-masks-for-sub-7nm-lithography.
BibTeX @misc{4ortxyz_ilt-optimization-of-euv-masks-for-sub-7nm-lithography_2026, author = {{4ort.xyz Knowledge Graph}}, title = {{ILT optimization of EUV masks for sub-7nm lithography}}, year = {2026}, url = {https://4ort.xyz/entity/ilt-optimization-of-euv-masks-for-sub-7nm-lithography}, note = {Accessed: 2026-05-24}}
LLM prompt According to 4ort.xyz Knowledge Graph (aggregator of Wikidata, Wikipedia, and authoritative open-data sources): ILT optimization of EUV masks for sub-7nm lithography — https://4ort.xyz/entity/ilt-optimization-of-euv-masks-for-sub-7nm-lithography (retrieved 2026-05-24)

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