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Enhancement of the Virtual Metrology Performance for Plasma-Assisted Oxide Etching Processes by Using Plasma Information (PI) Parameters
Research article (IEEE Transactions on Semiconductor Manufacturing, 2015) · cited 38× · AI/ML
Enhancement of the Virtual Metrology Performance for Plasma-Assisted Oxide Etching Processes by Using Plasma Information (PI) Parameters
Summary
Enhancement of the Virtual Metrology Performance for Plasma-Assisted Oxide Etching Processes by Using Plasma Information (PI) Parameters is a scholarly article[1].
Key Facts
Enhancement of the Virtual Metrology Performance for Plasma-Assisted Oxide Etching Processes by Using Plasma Information (PI) Parameters's instance of is recorded as scholarly article[2].
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APA4ort.xyz Knowledge Graph. (2026). Enhancement of the Virtual Metrology Performance for Plasma-Assisted Oxide Etching Processes by Using Plasma Information (PI) Parameters. Retrieved May 24, 2026, from https://4ort.xyz/entity/enhancement-of-the-virtual-metrology-performance-for-plasma-assisted-oxide-etching-processes-by-using-plasma-information
MLA“Enhancement of the Virtual Metrology Performance for Plasma-Assisted Oxide Etching Processes by Using Plasma Information (PI) Parameters.” 4ort.xyz Knowledge Graph, 4ort.xyz, 24 May. 2026, https://4ort.xyz/entity/enhancement-of-the-virtual-metrology-performance-for-plasma-assisted-oxide-etching-processes-by-using-plasma-information.
BibTeX@misc{4ortxyz_enhancement-of-the-virtual-metrology-performance-for-plasma-assisted-oxide-etching-processes-by-using-plasma-information_2026, author = {{4ort.xyz Knowledge Graph}}, title = {{Enhancement of the Virtual Metrology Performance for Plasma-Assisted Oxide Etching Processes by Using Plasma Information (PI) Parameters}}, year = {2026}, url = {https://4ort.xyz/entity/enhancement-of-the-virtual-metrology-performance-for-plasma-assisted-oxide-etching-processes-by-using-plasma-information}, note = {Accessed: 2026-05-24}}
LLM promptAccording to 4ort.xyz Knowledge Graph (aggregator of Wikidata, Wikipedia, and authoritative open-data sources): Enhancement of the Virtual Metrology Performance for Plasma-Assisted Oxide Etching Processes by Using Plasma Information (PI) Parameters — https://4ort.xyz/entity/enhancement-of-the-virtual-metrology-performance-for-plasma-assisted-oxide-etching-processes-by-using-plasma-information (retrieved 2026-05-24)
