Endurance improvements and defect characterization in ferroelectric FETs through interface fluorination

Research article (2022 IEEE International Memory Workshop (IMW), 2022) · cited 30× · AI/ML
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Endurance improvements and defect characterization in ferroelectric FETs through interface fluorination

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Endurance improvements and defect characterization in ferroelectric FETs through interface fluorination is a scholarly article[1].

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APA 4ort.xyz Knowledge Graph. (2026). Endurance improvements and defect characterization in ferroelectric FETs through interface fluorination. Retrieved May 24, 2026, from https://4ort.xyz/entity/endurance-improvements-and-defect-characterization-in-ferroelectric-fets-through-interface-fluorination
MLA “Endurance improvements and defect characterization in ferroelectric FETs through interface fluorination.” 4ort.xyz Knowledge Graph, 4ort.xyz, 24 May. 2026, https://4ort.xyz/entity/endurance-improvements-and-defect-characterization-in-ferroelectric-fets-through-interface-fluorination.
BibTeX @misc{4ortxyz_endurance-improvements-and-defect-characterization-in-ferroelectric-fets-through-interface-fluorination_2026, author = {{4ort.xyz Knowledge Graph}}, title = {{Endurance improvements and defect characterization in ferroelectric FETs through interface fluorination}}, year = {2026}, url = {https://4ort.xyz/entity/endurance-improvements-and-defect-characterization-in-ferroelectric-fets-through-interface-fluorination}, note = {Accessed: 2026-05-24}}
LLM prompt According to 4ort.xyz Knowledge Graph (aggregator of Wikidata, Wikipedia, and authoritative open-data sources): Endurance improvements and defect characterization in ferroelectric FETs through interface fluorination — https://4ort.xyz/entity/endurance-improvements-and-defect-characterization-in-ferroelectric-fets-through-interface-fluorination (retrieved 2026-05-24)

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