Continuum model for nanocolumn growth during low-pressure vapour deposition.

Summary

Continuum model for nanocolumn growth during low-pressure vapour deposition. is a doctoral thesis^[1].

Key Facts

• Continuum model for nanocolumn growth during low-pressure vapour deposition. authored Yicun Huang^[2].
• Continuum model for nanocolumn growth during low-pressure vapour deposition.'s instance of is recorded as doctoral thesis^[3].
• Continuum model for nanocolumn growth during low-pressure vapour deposition.'s publisher is recorded as UC Research Repository^[4].
• Continuum model for nanocolumn growth during low-pressure vapour deposition.'s DOI is recorded as 10.26021/1616^[5].
• Continuum model for nanocolumn growth during low-pressure vapour deposition.'s language of work or name is recorded as English^[6].
• Continuum model for nanocolumn growth during low-pressure vapour deposition.'s country of origin is recorded as New Zealand^[7].
• Continuum model for nanocolumn growth during low-pressure vapour deposition.'s publication date is recorded as +2019-00-00T00:00:00Z^[8].
• Continuum model for nanocolumn growth during low-pressure vapour deposition.'s main subject is recorded as mechanical engineering^[9].
• Continuum model for nanocolumn growth during low-pressure vapour deposition.'s work available at URL is recorded as https://ir.canterbury.ac.nz/handle/10092/18618^[10].
• Continuum model for nanocolumn growth during low-pressure vapour deposition.'s Handle ID is recorded as 10092/18618^[11].
• Continuum model for nanocolumn growth during low-pressure vapour deposition.'s title is recorded as Continuum model for nanocolumn growth during low-pressure vapour deposition.^[12].
• Continuum model for nanocolumn growth during low-pressure vapour deposition.'s copyright holder is recorded as Yicun Huang^[13].
• Continuum model for nanocolumn growth during low-pressure vapour deposition.'s thesis submitted to is recorded as University of Canterbury^[14].
• Continuum model for nanocolumn growth during low-pressure vapour deposition.'s on focus list of Wikimedia project is recorded as NZThesisProject^[15].
• Continuum model for nanocolumn growth during low-pressure vapour deposition.'s copyright status is recorded as copyrighted^[16].
• Continuum model for nanocolumn growth during low-pressure vapour deposition.'s online access status is recorded as open access^[17].
• Continuum model for nanocolumn growth during low-pressure vapour deposition.'s thesis committee member is recorded as Catherine Bishop^[18].

Body

Designation and Status

Continuum model for nanocolumn growth during low-pressure vapour deposition.'s instance of is recorded as doctoral thesis^[3].