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Coating Thickness Controls Crystallinity and Enables Homoepitaxial Growth of Ultra‐Thin‐Channel Blade‐Coated In<sub>2</sub>O<sub>3</sub> Transistors
Coating Thickness Controls Crystallinity and Enables Homoepitaxial Growth of Ultra‐Thin‐Channel Blade‐Coated In2O3 Transistors
Summary
Coating Thickness Controls Crystallinity and Enables Homoepitaxial Growth of Ultra‐Thin‐Channel Blade‐Coated In2O3 Transistors is a scholarly article[1].
Key Facts
Coating Thickness Controls Crystallinity and Enables Homoepitaxial Growth of Ultra‐Thin‐Channel Blade‐Coated In2O3 Transistors's instance of is recorded as scholarly article[2].
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APA4ort.xyz Knowledge Graph. (2026). Coating Thickness Controls Crystallinity and Enables Homoepitaxial Growth of Ultra‐Thin‐Channel Blade‐Coated In<sub>2</sub>O<sub>3</sub> Transistors. Retrieved May 24, 2026, from https://4ort.xyz/entity/coating-thickness-controls-crystallinity-and-enables-homoepitaxial-growth-of-ultrathinchannel-bladecoated-in-sub-2-sub-o