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Application of EUV resolution enhancement techniques (RET) to optimize and extend single exposure bi-directional patterning for 7nm and beyond logic designs
Research article (Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE, 2016) · cited 18× · AI/ML
Application of EUV resolution enhancement techniques (RET) to optimize and extend single exposure bi-directional patterning for 7nm and beyond logic designs
Summary
Application of EUV resolution enhancement techniques (RET) to optimize and extend single exposure bi-directional patterning for 7nm and beyond logic designs is a scholarly article[1].
Key Facts
Application of EUV resolution enhancement techniques (RET) to optimize and extend single exposure bi-directional patterning for 7nm and beyond logic designs's instance of is recorded as scholarly article[2].
References
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APA4ort.xyz Knowledge Graph. (2026). Application of EUV resolution enhancement techniques (RET) to optimize and extend single exposure bi-directional patterning for 7nm and beyond logic designs. Retrieved May 24, 2026, from https://4ort.xyz/entity/application-of-euv-resolution-enhancement-techniques-ret-to-optimize-and-extend-single-exposure-bi-directional-patternin
MLA“Application of EUV resolution enhancement techniques (RET) to optimize and extend single exposure bi-directional patterning for 7nm and beyond logic designs.” 4ort.xyz Knowledge Graph, 4ort.xyz, 24 May. 2026, https://4ort.xyz/entity/application-of-euv-resolution-enhancement-techniques-ret-to-optimize-and-extend-single-exposure-bi-directional-patternin.
BibTeX@misc{4ortxyz_application-of-euv-resolution-enhancement-techniques-ret-to-optimize-and-extend-single-exposure-bi-directional-patternin_2026, author = {{4ort.xyz Knowledge Graph}}, title = {{Application of EUV resolution enhancement techniques (RET) to optimize and extend single exposure bi-directional patterning for 7nm and beyond logic designs}}, year = {2026}, url = {https://4ort.xyz/entity/application-of-euv-resolution-enhancement-techniques-ret-to-optimize-and-extend-single-exposure-bi-directional-patternin}, note = {Accessed: 2026-05-24}}
LLM promptAccording to 4ort.xyz Knowledge Graph (aggregator of Wikidata, Wikipedia, and authoritative open-data sources): Application of EUV resolution enhancement techniques (RET) to optimize and extend single exposure bi-directional patterning for 7nm and beyond logic designs — https://4ort.xyz/entity/application-of-euv-resolution-enhancement-techniques-ret-to-optimize-and-extend-single-exposure-bi-directional-patternin (retrieved 2026-05-24)
