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30 nm X-ray focusing correlates oscillatory stress, texture and structural defect gradients across multilayered TiN-SiOx thin film
Research article (Acta Materialia, 2017) · cited 69× · AI/ML
30 nm X-ray focusing correlates oscillatory stress, texture and structural defect gradients across multilayered TiN-SiOx thin film
Summary
30 nm X-ray focusing correlates oscillatory stress, texture and structural defect gradients across multilayered TiN-SiOx thin film is a scholarly article[1].
Key Facts
30 nm X-ray focusing correlates oscillatory stress, texture and structural defect gradients across multilayered TiN-SiOx thin film's instance of is recorded as scholarly article[2].
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