# Towards a novel positive tone resist mr-PosEBR for high resolution electron-beam lithography

> Research article (Microelectronic Engineering, 2016) · cited 13× · AI/ML

**Wikidata**: [openalex:W2277751102](https://www.wikidata.org/wiki/openalex:W2277751102)  
**Source**: https://4ort.xyz/entity/towards-a-novel-positive-tone-resist-mr-posebr-for-high-resolution-electron-beam-lithography