# Theoretical study on trade-off relationships between resolution, line edge roughness, and sensitivity in resist processes for semiconductor manufacturing by extreme ultraviolet lithography

> Research article (Japanese Journal of Applied Physics, 2019) · cited 11× · AI/ML

**Wikidata**: [openalex:W2966564523](https://www.wikidata.org/wiki/openalex:W2966564523)  
**Source**: https://4ort.xyz/entity/theoretical-study-on-trade-off-relationships-between-resolution-line-edge-roughness-and-sensitivity-in-resist-processes-