# Sub-70 nm resolution patterning of high etch-resistant epoxy novolac resins using gas permeable templates in ultraviolet nanoimprint lithography

> Research article (Applied Physics Express, 2016) · cited 16× · AI/ML

**Wikidata**: [openalex:W2337189718](https://www.wikidata.org/wiki/openalex:W2337189718)  
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