# Shot noise limit of sensitivity of chemically amplified resists used for extreme ultraviolet lithography

> Research article (Japanese Journal of Applied Physics, 2015) · cited 21× · AI/ML

**Wikidata**: [openalex:W2237099638](https://www.wikidata.org/wiki/openalex:W2237099638)  
**Source**: https://4ort.xyz/entity/shot-noise-limit-of-sensitivity-of-chemically-amplified-resists-used-for-extreme-ultraviolet-lithography
