# Sensitivity Enhancement of SiO<sub>2</sub>Plasma Etching Endpoint Detection Using Modified Gaussian Mixture Model

> Research article (IEEE Transactions on Semiconductor Manufacturing, 2020) · cited 17× · AI/ML

**Wikidata**: [openalex:W3006059575](https://www.wikidata.org/wiki/openalex:W3006059575)  
**Source**: https://4ort.xyz/entity/sensitivity-enhancement-of-sio-sub-2-sub-plasma-etching-endpoint-detection-using-modified-gaussian-mixture-model