# Robust hybrid source and mask optimization to lithography source blur and flare

> Research article (Applied Optics, 2015) · cited 26× · AI/ML

**Wikidata**: [openalex:W982938708](https://www.wikidata.org/wiki/openalex:W982938708)  
**Source**: https://4ort.xyz/entity/robust-hybrid-source-and-mask-optimization-to-lithography-source-blur-and-flare