# Proximity effect correction in electron-beam lithography based on computation of critical-development time with swarm intelligence

> Research article (Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena, 2017) · cited 23× · AI/ML

**Wikidata**: [openalex:W2752240660](https://www.wikidata.org/wiki/openalex:W2752240660)  
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