# Overlay and edge placement control strategies for the 7nm node using EUV and ArF lithography

> Research article (Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE, 2015) · cited 68× · AI/ML

**Wikidata**: [openalex:W2059100750](https://www.wikidata.org/wiki/openalex:W2059100750)  
**Source**: https://4ort.xyz/entity/overlay-and-edge-placement-control-strategies-for-the-7nm-node-using-euv-and-arf-lithography