# Outlook for high-NA EUV patterning: a holistic patterning approach to address upcoming challenges

> Research article (Advanced Etch Technology and Process Integration for Nanopatterning XI, 2022) · cited 12× · AI/ML

**Wikidata**: [openalex:W4281564189](https://www.wikidata.org/wiki/openalex:W4281564189)  
**Source**: https://4ort.xyz/entity/outlook-for-high-na-euv-patterning-a-holistic-patterning-approach-to-address-upcoming-challenges