# Optimization and sensitivity enhancement of high-resolution molecular resist for EUV lithography

> Research article (Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE, 2016) · cited 10× · AI/ML

**Wikidata**: [openalex:W2320320955](https://www.wikidata.org/wiki/openalex:W2320320955)  
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