# On the dependencies of the stochastic patterning-failure cliffs in EUVL lithography

> Research article (Extreme Ultraviolet (EUV) Lithography XI, 2020) · cited 10× · AI/ML

**Wikidata**: [openalex:W3013212719](https://www.wikidata.org/wiki/openalex:W3013212719)  
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