# Multi-objective lithographic source mask optimization to reduce the uneven impact of polarization aberration at full exposure field

> Research article (Optics Express, 2019) · cited 19× · AI/ML

**Wikidata**: [openalex:W2945508544](https://www.wikidata.org/wiki/openalex:W2945508544)  
**Source**: https://4ort.xyz/entity/multi-objective-lithographic-source-mask-optimization-to-reduce-the-uneven-impact-of-polarization-aberration-at-full-exp