# mr-PosEBR: a novel positive tone resist for high resolution electron beam lithography and 3D surface patterning

> Research article (Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE, 2016) · cited 14× · AI/ML

**Wikidata**: [openalex:W2304255342](https://www.wikidata.org/wiki/openalex:W2304255342)  
**Source**: https://4ort.xyz/entity/mr-posebr-a-novel-positive-tone-resist-for-high-resolution-electron-beam-lithography-and-3d-surface-patterning