# Mitigation of mask three-dimensional induced phase effects by absorber optimization in ArF<sub>i</sub>and extreme ultraviolet lithography

> Research article (Journal of Micro/Nanolithography MEMS and MOEMS, 2016) · cited 41× · AI/ML

**Wikidata**: [openalex:W2346466680](https://www.wikidata.org/wiki/openalex:W2346466680)  
**Source**: https://4ort.xyz/entity/mitigation-of-mask-three-dimensional-induced-phase-effects-by-absorber-optimization-in-arf-sub-i-sub-and-extreme-ultravi