# Metal layer single EUV expose at pitch 28: how bright field and NTD resist advantages align

> Research article (Extreme Ultraviolet (EUV) Lithography XII, 2021) · cited 10× · AI/ML

**Wikidata**: [openalex:W3129736441](https://www.wikidata.org/wiki/openalex:W3129736441)  
**Source**: https://4ort.xyz/entity/metal-layer-single-euv-expose-at-pitch-28-how-bright-field-and-ntd-resist-advantages-align