# Mask-induced best-focus-shifts in DUV and EUV lithography

> Research article (Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE, 2015) · cited 12× · AI/ML

**Wikidata**: [openalex:W2074771653](https://www.wikidata.org/wiki/openalex:W2074771653)  
**Source**: https://4ort.xyz/entity/mask-induced-best-focus-shifts-in-duv-and-euv-lithography