# Mask-induced best-focus shifts in deep ultraviolet and extreme ultraviolet lithography

> Research article (Journal of Micro/Nanolithography MEMS and MOEMS, 2016) · cited 30× · AI/ML

**Wikidata**: [openalex:W2293658215](https://www.wikidata.org/wiki/openalex:W2293658215)  
**Source**: https://4ort.xyz/entity/mask-induced-best-focus-shifts-in-deep-ultraviolet-and-extreme-ultraviolet-lithography