# Low-Frequency Noise Properties in Double-Gate Amorphous InGaZnO Thin-Film Transistors Fabricated by Back-Channel-Etch Method

> Research article (IEEE Electron Device Letters, 2015) · cited 22× · AI/ML

**Wikidata**: [openalex:W2136387271](https://www.wikidata.org/wiki/openalex:W2136387271)  
**Source**: https://4ort.xyz/entity/low-frequency-noise-properties-in-double-gate-amorphous-ingazno-thin-film-transistors-fabricated-by-back-channel-etch-me
