# Lithography overlay control improvement using patterned wafer geometry for sub-22nm technology nodes

> Research article (Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE, 2015) · cited 12× · AI/ML

**Wikidata**: [openalex:W1968935053](https://www.wikidata.org/wiki/openalex:W1968935053)  
**Source**: https://4ort.xyz/entity/lithography-overlay-control-improvement-using-patterned-wafer-geometry-for-sub-22nm-technology-nodes