# Investigation of mask absorber induced image shift in EUV lithography

> Research article (Extreme Ultraviolet (EUV) Lithography X, 2019) · cited 18× · AI/ML

**Wikidata**: [openalex:W2921221953](https://www.wikidata.org/wiki/openalex:W2921221953)  
**Source**: https://4ort.xyz/entity/investigation-of-mask-absorber-induced-image-shift-in-euv-lithography