# In situ capture of spatter signature of SLM process using maximum entropy double threshold image processing method based on genetic algorithm

> Research article (Optics & Laser Technology, 2020) · cited 49× · AI/ML

**Wikidata**: [openalex:W3034521819](https://www.wikidata.org/wiki/openalex:W3034521819)  
**Source**: https://4ort.xyz/entity/in-situ-capture-of-spatter-signature-of-slm-process-using-maximum-entropy-double-threshold-image-processing-method-based