# Improving detection of plasma etching end point using light compensation on optical emission spectra

> Research article (Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena, 2022) · cited 13× · AI/ML

**Wikidata**: [openalex:W4296210049](https://www.wikidata.org/wiki/openalex:W4296210049)  
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