# High-NA EUV lithography exposure tool: key advantages and program progress

> Research article (Extreme Ultraviolet (EUV) Lithography XII, 2021) · cited 20× · AI/ML

**Wikidata**: [openalex:W4249506799](https://www.wikidata.org/wiki/openalex:W4249506799)  
**Source**: https://4ort.xyz/entity/high-na-euv-lithography-exposure-tool-key-advantages-and-program-progress