# High-NA EUV lithography exposure tool: advantages and program progress

> Research article (Extreme Ultraviolet Lithography 2020, 2020) · cited 44× · AI/ML

**Wikidata**: [openalex:W3088483806](https://www.wikidata.org/wiki/openalex:W3088483806)  
**Source**: https://4ort.xyz/entity/high-na-euv-lithography-exposure-tool-advantages-and-program-progress