# Gradient-based optimization for efficient exposure planning in maskless lithography

> Research article (Journal of Micro/Nanolithography MEMS and MOEMS, 2017) · cited 10× · AI/ML

**Wikidata**: [openalex:W2753417879](https://www.wikidata.org/wiki/openalex:W2753417879)  
**Source**: https://4ort.xyz/entity/gradient-based-optimization-for-efficient-exposure-planning-in-maskless-lithography