# Fast heuristic-based source mask optimization for EUV lithography using dual edge evolution and partial sampling

> Research article (Optics Express, 2021) · cited 16× · AI/ML

**Wikidata**: [openalex:W3174647626](https://www.wikidata.org/wiki/openalex:W3174647626)  
**Source**: https://4ort.xyz/entity/fast-heuristic-based-source-mask-optimization-for-euv-lithography-using-dual-edge-evolution-and-partial-sampling