# Enhancement of the Virtual Metrology Performance for Plasma-Assisted Oxide Etching Processes by Using Plasma Information (PI) Parameters

> Research article (IEEE Transactions on Semiconductor Manufacturing, 2015) · cited 38× · AI/ML

**Wikidata**: [openalex:W2507856496](https://www.wikidata.org/wiki/openalex:W2507856496)  
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