# Enabling sub-10nm node lithography: presenting the NXE:3400B EUV scanner

> Research article (Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE, 2017) · cited 83× · AI/ML

**Wikidata**: [openalex:W2598439029](https://www.wikidata.org/wiki/openalex:W2598439029)  
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